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Solubility of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in 2,2,4-Trimethylpentane at

Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2

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【PDF】Breakdown Characteristics of SF6/CF4 Mixtures in Test Chamber

SF6/CF4 Mixtures in Test Chamber and 25.8kV GIS Shin-Woo Park, Chung- SF6 gas has excellent dielectric strength, but it causes global warming

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Solubility of Gases in Liquids. 20. Solubility of He, Ne, Ar,

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SF6 used in electrical power facilities and to g3 gas with 4% NOVECTM 4710/96% CO2 was Trifluoroiodomethane (CF3I) has been introduced

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(X=1-3) fragments from N2---SF6 and N2---CF4 discharges -

K. (1994) Possible reaction of atomic nitrogen with SFx (X=1-5 and CFx (X=1-3) fragments from N2---SF6 and N2---CF4 discharges Chemical

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"The Solubility of Gases in Liquids 9. Solubility of He, Ne,

The Solubility of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some Dimethylcyclohexanes at 298

SF6, CO, CH4, C2H4, C2H6, CF4, CO2, C4F8, O2, Ar, Ne, He, Kr,

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9 Unit 1660 MFC UFC 1660 CF4 H2 CL2 N2 HBR SF6 Different Gas

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Electron swarm coefficients in SF6 and CF4 gas mixtures from

Electron swarm coefficients in SF6 and CF4 gas mixtures from Monte Analysis of the insulation characteristics of c-C4F8 and N2 gas

"Solubility of Gases in Liquids. 19. Solubility of He, Ne, Ar

"Solubility of Gases in Liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2, O2, CH4, CF4, and SF6 in Normal 1-Alkanols n-ClH2l+lOH (1

Anaesthetic Potency of CF4 and SF6 in Dogs

implying that the site of action of the anaesthetic gas is in the lipidatmosphere for CF4 hydrate9 and 1.0 atmosphere for SF6 hydrate10 at 0°

Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

for remote sensing of greenhouse gases CH4, CF4 and SF6

Highly symmetrical molecules such as CH4, CF4 or SF6 are known to be atmospheric pollutants and greenhouse gases. High-resolution spectroscopy in the

Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

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- Reactive ion etching of SiC in SF6 gas: detection of CF,

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Characterization and antimicrobial properties of fluorine-

A mixture of acetylene (C2H2) and carbon tetrafluoride (CF4) gas was 115° were found, depending on the treatment time and power used [21,

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SF6 /N2 -- 5 -- 2 19 SF6/CF4 2 62 7 46 16 MIXED GAS CIRCUIT BREAKERS • S•FF6i/rNst2 mixture: breakers purchased (1988 – 1990) were

Comparison of SF6 and CF4 Plasma Treatment for Surface Hydro

SF6 and CF4 gases, leading to high corresponding to the N2 molecule are observed (-generated plasmas produced in Ar/SF6 mixtures

【PDF】limiting field strength of SF6-N2O and CF3I-SF6-N2 mixtures

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dielectric breakdown properties of hot SF6–CF4 mixtures

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Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

distribution, and reproduction in any medium, (SF6) is used as a gas medium in gas-O2, N2, CF4, and Ar, plasma, and so forth

Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SF<sub>6</sub> gas has excellent dielectric strength, but it causes global warming about 23900 times more than CO<sub>2</

Inference from Arbitrary Uncertainty using Mixtures of

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Anisotropic etching of Si and WSiN using ECR plasma of SF6-CF4 gas mixture on ResearchGate, the professional network for scientists. Anisotropic etchin